CMP & Cleans CONSULTANTS

Laurence D. Schultz

Principal

4505 Sanderosa Lane
Richardson, TX 75082-2688
Phone: 972.234.2262
Fax: 972.234.2263

l.schultz@cmpengineer.com
 

Practical Technology Solutions
 

Laurence Schultz, Principal

Resume

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A self-directed, creative professional driven to achieve, with 20+ years of experience in the microelectronics field.  Demonstrated expertise in Research and Development, Technology Transfer, and in Manufacturing.  Offering a customer service focus and the outstanding ability to mentor and grow team members.  Proven skills in:

§         Process Development

§         Advanced Technology

§         Benchmarking

§         Cross Functional Teams

§         Process Modeling

§         Project Management

§         Research & Development

§         Technical Documentation

§         Technology Transfer

§         Telecommunications Technology

ACHIEVEMENTS:

Developed CMP process at MCC through careful analysis, troubleshooting, perseverance, and innovation.  Result:  Produced a process capable of processing 1000 wafers with non-uniformity of 5%.

Implemented CMP project by processing 9600 wafer passes per year, and training 4 operators in technical application.  Result:  Received Outstanding Technical Achievement award.

Devised a method for reducing manufacturing cost by as much as $1/wafer pass, potentially totaling $1.5M per year by eliminating the need for a consumable item used in the process.  Result: Obtained 14th patent.

Demonstrated outstanding technical expertise by explaining complex issues of CMP, advancing knowledge of the process, and promoting creative ideas.  Result:  Received “Key Team Player” award and personal letter of congratulations from Bob Noyce, a pioneer of the microelectronics industry.

Coached/Mentored personnel by connecting, mentoring, encouraging and spotlighting their accomplishments.  Result:  Effectively trained and developed 50+ management and technical staff.

Introduced Cobalt processing into manufacturing by establishing Cobalt protocol and monitoring all results of contamination testing through my process.  Result:  Received a cash award from Lucent.

Invented a method to determine endpoint during the CMP process by creating a meticulous step-by-step problem solving approach leading to the complex solution.  Result:  Granted 1st U.S. patent.

PROFESSIONAL EXPERIENCE:

CMP PROCESS ENGINEER                                                                                                  2001-2003

Texas Instruments, Dallas, TX

Process owner for Shallow Trench Isolation (STI) CMP: Developed new endpoint algorithm for Applied Materials Planarizaion system. Conducted group meetings and published minutes. Backed up process owners for oxide and copper CMP during their absence from plant. Investigated emerging technologies.  Process owner for Tungsten CMP:  Harmonization of two FABs with divergent processes.  Qualified new products for manufacturing. Interfaced with customers (internal and external) and suppliers. Maintained Statistical Factory Control process. Recruited technical staff and mentored other engineers. Applied for patent (“Slurry Conditioning for CMP”).

SENIOR CMP PROCESS ENGINEER                                                                        1996 – 2001

Member Technical Staff (MTS)

Bell Labs/Agere Systems/Lucent Technologies, Orlando, FL

Demonstrated success in Integrated Circuit (IC) process development and technology transfer to manufacturing.  Led team to develop and transfer oxide and tungsten processes to manufacturing.  Ensured process manufacturability, identification and solution of problems, introduction of new products, tool selection and training operations personnel in process, use of endpoint systems and protocol for 6” and 8” Tungsten CMP manufacturing lines.  Developed tungsten CMP process and increased process capability (Cpk) from 0.5 to 1.5 through identifying causes of excursions.  Converted manufacturing fab from 6” to 8” processes.  Interfaced with all areas to identify and fix problems related to CMP process.  Demonstrated strong data analysis ability/presentations to customers.

 

Micron Semiconductor, Boise, ID

 

CMP ENGINEER
  1989 – 1996

Developed oxide CMP process, trained staff and brought up 2 cleanrooms while maintaining manufacturing schedule.  Defined direction of development efforts.  Developed, implemented and maintained CMP and related processes.  Interfaced with vendors including tool selection and supplier improvement.  Trained 30 supervisors, engineers and operators in CMP process.

 

PD-1 ENGINEER (Development)

Developed CMP processes, including TEOS, Poly, and BPSG Polish and associated cleans.  SEMATECH Assignee, Austin, TX: Defined CMP process strategies, tool selection/purchase.

 

SENIOR RESEARCH TECHNICIAN                                                                          1984 – 1989

Microelectronics and Computer Research Technology Corp., Austin, TX

Development of Subtractive Processes.  Purchased early Westech polisher and developed polish planarization process for copper/Polyimide.  Developed and maintained wet and dry etch processes.  Developed and implemented polish planarization process for medium film substrates.

 

EDUCATION/TECHNICAL ACCOMPLISHMENTS:

 

§         Austin Community College

§         Southern Methodist University

§         Grand Valley State College

§         Muskegon Community College

§         Awarded 14 Patents for original, inventive technical ideas

 

PROFESSIONAL AFFILIATIONS:

§         Toastmasters International

§         Commercialization Grant Program (CPG) volunteer evaluator for the North Texas Emerging Technology Fund.

 

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